Recent Advancements in EUV Resist Materials and Process Performance

Author:

Goethals Anne Marie1,Niroomand Ardman2,Van Roey Frieda1,Hosokawa Kohei3,Pollentier Irvan1

Affiliation:

1. IMEC

2. Micron Technology

3. Elpida

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference17 articles.

1. [1] Chawon Koh, Jacque Georger, Liping Ren, George Huang, Frank Goodwin, Stefan Wurm, Dominic Ashworth, Warren Montgomery, Bill Pierson, Joo-on Park, and Patrick Naulleau, Proc. of SPIE Vol. 7636 (2010),763604.

2. [2] Hyun-Woo Kim, Hai-Sub Na, Kyoung-Yong Cho, Chang-Min Park, Takahiro Yasue, Subramanya Mayya, and Han-Ku Cho, Proc. of SPIE Vol. 7636 (2010), 76360Q.

3. [3] Kentara Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Gousuke Shiraishi, Kazuyki Matsunaro, Julius Joseph Santillan, and Toshiro Itani, J. Photopolym. Sci. Technol., vol. 23, N0 5 (2010), 613-618.

4. [4] E. Steve Putna, Todd R. Younkin, Roman Caudillo, and Manish Chandhok, Proc. of SPIE Vol. 7636 (2010), 76360P.

5. [5] Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, and Kurt Ronse, J. Photopolym. Sci. Technol., vol. 20, N0 3 (2007), 383-392.

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