Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography
Author:
Affiliation:
1. Department of Chemistry, University of California
2. Motorola Assignee to International SEMATECH
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/16/1/16_1_27/_pdf
Reference40 articles.
1. 1. Ito, H.; Wallraff, G.M.; Fender, N.; Brock, P.J., Larson, C.E.; Truong, H.D.; Breyta, G.; Miller, D.C.; Sherwood, M.H., Allen, R.D., J. Photopolym. Sci. Tehnol., 14 (2001), 583.
2. 2. (a) The National Technology Road map for Semiconductors; Semiconductor Industry Association (SIA): San Jose, CA, 1997.
3. (b) Wallraff, G.M.; Hinsberg W.D., Chem Rev., 99 (1999), 1801.
4. 3. (a) Kunz, R.R.; Bloomstein, T.M.; Hardy, D.E.; Goodman, R.B.; Downs, D.K.; Curtin, J.E., J. Vac. Sci. Technol. B, 17 (1999), 3267.
5. (b) Pasini, D.; Klopp, J.M., Fréchet, J.M.J., Chem. Mater., 13 (2001), 4136.
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