Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

Author:

Pasini Dario1,Klopp John M.1,Fréchet Jean M. J.1

Affiliation:

1. Center for New Directions in Organic Synthesis, Department of Chemistry, University of California, Berkeley, California 94720-1460, and Division of Materials Science, Lawrence Berkeley National Laboratory, Berkeley, California

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Reference58 articles.

1. The National TechnologyRoad mapfor Semiconductors; Semiconductor Industry Association (SIA):  San Jose, CA, 1997.

2. Organic imaging materials: a view of the future

3. Dry Etch Resistance of Organic Materials

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