Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography-Reference-Cited by-同舟云学术

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

Published:2001-10-09 Issue:11 Volume:13 Page:4136-4146
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Pasini Dario¹,Klopp John M.¹,Fréchet Jean M. J.¹

Affiliation:

1. Center for New Directions in Organic Synthesis, Department of Chemistry, University of California, Berkeley, California 94720-1460, and Division of Materials Science, Lawrence Berkeley National Laboratory, Berkeley, California

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0104304

Reference58 articles.

1. The National TechnologyRoad mapfor Semiconductors; Semiconductor Industry Association (SIA): San Jose, CA, 1997.

2. Organic imaging materials: a view of the future

3. Dry Etch Resistance of Organic Materials

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