Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties-Reference-Cited by-同舟云学术

Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties

Published:2022-10-08 Issue:42 Volume:144 Page:19508-19520
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Deng Jingyuan¹²^ORCID,Bailey Sean²³^ORCID,Jiang Shaoyi²³^ORCID,Ober Christopher K.²^ORCID

Affiliation:

1. Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, United States

2. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States

3. Department of Biomedical Engineering, Cornell University, Ithaca, New York 14853, United States

Funder

Intel Corporation

Cornell University

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/jacs.2c08202

Reference94 articles.

1. Evolution of patterning materials towards the Moore’s Law 2.0 Era

2. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results

3. Advances in Patterning Materials for 193 nm Immersion Lithography

4. Projection optical lithography

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self-Immolative Polymers: From Synthesis to Applications;Annual Review of Materials Research;2024-08-05

2. Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance;Chemical Engineering Journal;2024-08

3. Aqueous Developable and CO₂‐Sourced Chemical Amplification Photoresist with High Performance;Angewandte Chemie International Edition;2024-07-10

4. Aqueous Developable and CO₂‐Sourced Chemical Amplification Photoresist with High Performance;Angewandte Chemie;2024-07-10

5. Chemically Amplified, Dry-Develop Poly(aldehyde) Photoresist;ECS Journal of Solid State Science and Technology;2024-05-01