Progress in EUV resist Performance-Reference-Cited by-同舟云学术

Progress in EUV resist Performance

Published:2006 Issue:4 Volume:19 Page:501-506
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Goethals A. M.,Gronheid R.,Van Roey F.,Solak H. H.,Ekinci Y.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/19/4/19_4_501/_pdf

Reference14 articles.

1. [1] H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H.-J. Voorma, U. Mickan, . Wolschrijn, B. Mertens, G. van Baars, P. Kurz and N. Harned, Proc. SPIE, 6151 (2006), 615108.

2. [2] H.H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S.O. Kim, J.F. Nealey, Microelectronic Engineering 67-68 (2003) 56-62.

3. [3] Roel Gronheid, Harun H. Solak, Yasin Ekinci, Amandine Jouve and Frieda Van Roey, Microelectronic Engineering 83 (2006), 1103-1106

4. [4] Roel Gronheid, Anne-Marie Goethals1, Peter Leunissen1, David Van Steenwinckel2, Harun H. Solak, "Resist evaluation using EUV interference lithography", presented at the 3rd International EUVL Symposium, 1-4 November, 2004, Miyazaki, Japan.

5. [5] A.M. Goethals, R. Gronheid, L.H.A. Leunissen , F. Van Roey, and H.H. Solak, J. Photopolym. Sci. Technol., Vol 18, N0 5(2005), 647-654.

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