Progress overview of EUV resists status towards high-NA EUV lithography-Reference-Cited by-同舟云学术

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Progress overview of EUV resists status towards high-NA EUV lithography

Published:2019-10-09 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2019
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Author:

Wang Xiaolong,Tseng Li-Ting,Mochi Iacopo,Vockenhuber Michaela,van Lent-Protasova Lidia,Custers Rolf,Rispens Gijsbert,Hoefnagels Rik,Ekinci Yasin

Publisher

SPIE

Reference22 articles.

1. Cost-effective shrink with holistic lithography, extended by EUV;Brink,2015

2. State-of-the-art EUV materials and processes for the 7nm node and beyond;Buitrago,2017

3. EUV Products and Business Opportunity;Fouquet,2018

4. EUV lithography: update on scanner and infrastructure progress;Finders,2019

5. High-NA EUV lithography: pushing the limits;Zahlten,2019

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