Author:
Wang Xiaolong,Tseng Li-Ting,Mochi Iacopo,Vockenhuber Michaela,Protasova Lidia,Custers Rolf,Rispens Gijsbert,Hoefangels Rik,Ekinci Yasin
Reference17 articles.
1. State-of-the-art EUV materials and processes for the 7nm node and beyond;Buitrago;Proc. SPIE,2017
2. Evaluation of EUV resist materials for use at the 32 nm half-pitch node
Cited by
1 articles.
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