Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet

Abstract

In this paper, the design of an efficient illuminator for extreme ultraviolet (EUV) applications such as photolithography, metrology, and microscopy is investigated. Illuminators are arrangements of optical components that allow us to tailor optical parameters to a targeted application. For the EUV spectral range, illuminators are commonly realized by an arrangement of several multilayer mirrors. Within this publication, design methods are developed to tailor optical parameters such as the intensity distribution, the spatial coherence, and the spectral bandwidth by using only one multilayer mirror. For the demonstration of the methods, an illuminator is designed for a compact in-lab EUV interference lithography system that is suited for industrial EUV resist qualification and large-area nanopatterning. The designed illuminator increases the wafer-throughput and improves the imaging quality.