Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference25 articles.
1. The theory and design of plate glass polishing machines;Preston;Journal of the Society of Glass Technology,1927
2. A Comparative Study on the Roles of Velocity in the Material Removal Rate during Chemical Mechanical Polishing
3. Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process
4. Pad roughness variation and its effect on material removal profile in ceria-based CMP slurry;Park;Journal of Material Process Technology,2008
5. Mathematical modeling of CMP conditioning process