A Comparative Study on the Roles of Velocity in the Material Removal Rate during Chemical Mechanical Polishing
Author:
Affiliation:
1. Department of Materials Science and Engineering, National Cheng‐Kung University, Tainan 701, Taiwan
2. Institute of Mechanical Engineering, National Chiao‐Tung University, Hsinchu 300, Taiwan
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1391872/pdf
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