Thermal Nitridation of SiO2 Films in Ammonia: Isotopic Tracing of Nitrogen and Oxygen in Further Stages and in Reoxidation
Author:
Affiliation:
1. Instituto de Física, UFRGS, 91540‐000 Porto Alegre, RS, Brazil
2. Instituto de Química, UFRGS, 91540‐000 Porto Alegre, RS, Brazil
3. Groupe de Physique des Solides, URA17‐CNRS, Université Paris 7 et 6, Paris 75251, France
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1837131/pdf
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