Chemical Vapor Deposition of Silicon Carbide/Titanium Carbide Composite Films from Dichlorodimethylsilane, Titanium Tetrachloride, and Methane-Reference-Cited by-同舟云学术

Chemical Vapor Deposition of Silicon Carbide/Titanium Carbide Composite Films from Dichlorodimethylsilane, Titanium Tetrachloride, and Methane

Published:1999-02-01 Issue:2 Volume:146 Page:564-569
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Takeuchi T.¹,Miyoshi H.¹²,Egashira Y.²,Komiyama H.¹

Affiliation:

1. Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo, Bunkyo‐ku, Tokyo 113, Japan

2. Division of Chemical Engineering, Department of Chemical Science and Engineering, Graduate School of Engineering Science, Osaka University, Toyonaka‐shi, Osaka 560, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391644/pdf

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