Scattering of low-energy electrons by TiCl4, GeCl4, SiCl4and CCl4: a comparison of elastic cross sections
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics
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2. Multiscale plasma and feature profile simulations of plasma-enhanced chemical vapor deposition and atomic layer deposition processes for titanium thin film fabrication;Japanese Journal of Applied Physics;2020-02-26
3. Negative ion formation through dissociative electron attachment to the group IV tetrachlorides: Carbon tetrachloride, silicon tetrachloride and germanium tetrachloride;International Journal of Mass Spectrometry;2018-03
4. Structural and Optical Properties of PECVD TiO2-SiO2Mixed Oxide Films for Optical Applications;Plasma Processes and Polymers;2016-04-18
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