Affiliation:
1. National Semiconductor Corporation, Santa Clara, California 95052‐8090
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-03
2. Preparation and certification of ion-implanted reference materials: A critical review (Technical Report);Pure and Applied Chemistry;1992-01-01
3. Ion implant standard;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
4. Comparison of modern uniformity-mapping techniques;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
5. Electron probe X-ray microanalysis as a non-destructive method for the quantitative determination of ion-implanted impurities in silicon;Fresenius' Journal of Analytical Chemistry;1991