Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS-Reference-Cited by-同舟云学术

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Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

Published:2004-03 Issue:1 Volume:217 Page:177-182
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Boudreault G,Claudio G,Jeynes C,Low R,Sealy B.J

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference19 articles.

1. J.T. Schener, A. Renan, J.C. Olson, D.L. Smatlak, A. Cucchetti, R. Sud, R. Bustin, in: Proceedings of the International Conference on Ion Implantation Technology, IEEE, Piscataway, 2000, p. 615

2. N. Nagai, Y. Tamura, S. Yuasa, K. Iwasawa, T. Matsumoto, M. Nakaya, M. Nakamura, T. Nagayama, in: Proceedings of the 2000 International Conference on Ion Implantation Technology, IEEE, Piscataway, 2000, p. 415

3. M. Samo, M. Kabasawa, M. Tsukihara, M. Sigitani, in: Proceedings of the 2000 International Conference on Ion Implantation Technology, IEEE, Piscataway, 2000, p. 682

4. An Industry‐Wide Evaluation of Ion Implant Dosing Accuracy

5. Technical report;Greis;Pure Appl. Chem.,1992

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quality assurance in an implantation laboratory by high accuracy RBS;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-08

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