Ion implant standard-Reference-Cited by-同舟云学术

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Ion implant standard

Published:1991-04 Issue:1-4 Volume:55 Page:275-280
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Larson L.A.,Keenan W.A.,Johnson W.H.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

1. An Industry‐Wide Evaluation of Ion Implant Dosing Accuracy

2. Proc. Int. Conf. on Semiconductor and Integrated Circuit Technology;Han,1989

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Materials and failure analysis methods and systems used in the development and manufacture of silicon integrated circuits;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-07

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