Effective Strategy for Porous Organosilicate to Suppress Oxygen Ashing Damage-Reference-Cited by-同舟云学术

Effective Strategy for Porous Organosilicate to Suppress Oxygen Ashing Damage

Published:2002 Issue:3 Volume:5 Page:G11
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Liu Po-Tsun,Chang T. C.,Mor Y. S.,Chen C. W.,Tsai T. M.,Chu C. J.,Pan F. M.,Sze S. M.

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference17 articles.

1. The National Technology Roadmap for Semiconductors , Semiconductor Industry Association, San Jose, CA (1997).

2. G. Sugahara, N. Aoi, M. Kubo, K. Arai, and K. Sawada, in International Dielectrics for ULSI Multilevel Interconnection, Proceedings of the Conference , p. 19 (1997).

3. The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

4. P. A. Kohl, Q. Zhao, K. Patel, D. Schmidt, S. A. Bidstrup-Allen, R. Shick, and S. Jayaraman, in Dielectric Materials Integration for Microelectronics , W. D. Brown, S. S. Ang, M. Loboda, B. Sammakia, R. Singh, and H. S. Rathore, Editors, PV 98-3, p. 169, The Electrochemical Society Proceedings Series, Pennington, NJ (1998).

5. Structure-Property Correlation in Low K Dielectric Materials

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of mixing CF4 with O2 on electron characteristics of capacitively coupled plasma;Physics of Plasmas;2023-01-01

2. Double perovskite Ba2FeMoO6−δ as fuel electrode for protonic-ceramic membranes;Solid State Ionics;2017-08

3. Comparison of the effects of downstream H2- and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03

4. Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-05

5. Stripping and Cleaning for Advanced Photolithography Applications;Handbook of Cleaning in Semiconductor Manufacturing;2011-02-22