Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

Author:

Thedjoisworo Bayu A.,Cheung David,Zamani Davoud

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF3 mixtures;Journal of Physics D: Applied Physics;2024-08-02

2. Two-step cycling process alternating implantation and remote plasma etching for topographically selective etching: Application to Si3N4 spacer etching;Journal of Applied Physics;2019-12-28

3. Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas;Journal of Physics D: Applied Physics;2018-11-28

4. Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11

5. Hydrogen desorption kinetics for aqueous hydrogen fluoride and remote hydrogen plasma processed silicon (001) surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-09

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