Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/1361-6463/aaefe0/pdf
Reference41 articles.
1. Silicon on insulator material technology
2. Highly selective etching of silicon nitride over silicon and silicon dioxide
3. Patterning of silicon nitride for CMOS gate spacer technology. I. Mechanisms involved in the silicon consumption in CH3F/O2/He high density plasmas
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