Author:
Romet S.,Couturier M. F.,Whidden T. K.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference33 articles.
1. The CHEMKIN Collection III, Sandia National Laboratories, Reaction Design, Albuquerque, NM (1998).
2. The Formation Mechanism and Step Coverage Quality of Tetraethylorthosilicate ‐ SiO2 Films Studied by the Micro/Macrocavity Method
3. Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane
4. T. Satake, T. Sorita, and H. Adachi, inChemical Vapor Deposition, T. M. Besmann, McD. Robinson, R. K. Ulrich, M. D. Allendorf, M. L. Hitchman, and H. Komiyama, Editors, PV 96-5, p. 23, The Electrochemical Society Proceedings Series, Pennington, NJ (1996).
5. TEOS and Ozone Atmospheric Pressure CVD of Borophosphosilicate Glass Films Using Triethylborate and Trimethylphosphate
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