Metallorganic Chemical Vapor Deposition of Pb(Zr, Ti)O[sub 3] Films Using a Single Mixture of Metallorganic Precursors-Reference-Cited by-同舟云学术

Metallorganic Chemical Vapor Deposition of Pb(Zr, Ti)O[sub 3] Films Using a Single Mixture of Metallorganic Precursors

Published:2001 Issue:10 Volume:148 Page:C668
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Kim Dae-Hwan,Na Jeong Seok,Rhee Shi-Woo

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Ferroelectric Memories

2. Large-area growth of Pb(Zr,Ti)O3 thin films by MOCVD

3. Ferroelectric properties of sol–gel deposited Pb(Zr,Ti)O3/LaNiO3 thin films on single crystal and platinized-Si substrates

4. Direct liquid injection MOCVD of high quality PLZT films

5. MOCVD of ferroelectric thin films

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