Author:
Okorn-Schmidt Harald F.,Holsteyns Frank,Lippert Alexander,Mui David,Kawaguchi Mark,Lechner Christiane,Frommhold Philipp E.,Nowak Till,Reuter Fabian,Piqué Miquel Banchs,Cairós Carlos,Mettin Robert
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Li X. Strojwas A. J. Swecker A. L. Reddy M. Milor L. Lin Y. T. , Modeling of defect propagation/growth for yield impact prediction in VLSI manufacturing, in Proc. SPIE 3216, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III, 167 (September 11, 1997).
2. International Technology Roadmap for Semiconductors, ITRS 2012 UPDATE, http://www.itrs.net/Links/2012ITRS/Home2012.htm.
3. Kern W. , Handbook of Semiconductor wafer cleaning technology, Noyes Publications, New Jersey (1993).
4. A sphere in contact with a plane wall in a slow linear shear flow
Cited by
41 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献