Communication—Effect of Hydrogen Water on Ceria Abrasive Removal in Post-CMP Cleaning
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/2162-8777/ab902c/pdf
Reference19 articles.
1. Hollow fiber membrane contactors
2. Large-scale application of membrane contactors for gas transfer from or to ultrapure water
3. Reevaluation of Hydrogen Gas Dissolved Cleaning Solutions in Single Wafer Megasonic Cleaning
4. Effect of Dissolved CO2 in De-Ionized Water in Reducing Wafer Damage During Megasonic Cleaning in MegPie
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A review on the development of ceria for chemical mechanical polishing;Powder Technology;2024-08
2. Environmentally friendly buff cleaning of ceria nanoparticles using bubbles in gas-dissolved water;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2023-08
3. Development of a pH-independent Post-CMP Cleaning Solution using Phosphoric Acid-based Surfactants for Removal of Ceria Nanoparticles;ECS Journal of Solid State Science and Technology;2023-07-01
4. Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction;Materials Science in Semiconductor Processing;2023-06
5. Recent advances and future developments in PVA brush scrubbing cleaning: A review;Materials Science in Semiconductor Processing;2022-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3