Abstract
The final polishing of silicon results in the irresistible formation of micro-defects (i.e., particle residues and scratches) on the surface. In view of this problem, the synergistic effect of surfactants and water-soluble polymers in inhibiting the micro-defects on the silicon surface was studied in this paper to improve the wettability of the slurry and reduce the micro-flocculation of abrasive particles. The results showed that the total number of residual particles (≥0.06 μm) on the polished surface was reduced from 24,784 to 277 with the adsorption of cationic polyacrylamide (CPAM) and fatty alcohol polyoxyethylene ether (AEO-9). The water-soluble polyvinylpyrrolidone (PVP) polymer could coat on the SiO2 abrasives, inhibit the flocculation of abrasive particles, avoid scratches on the silicon surface and further reduce the number of residual particles (≥0.06 μm) to 67 on the polished surface. Furthermore, a contact angle analyzer was used to characterize the wettability of the components in the slurry, and a large particle counter was used to analyze the changes in the number of large particles in the slurry component. Finally, a mechanism of surfactants and a water-soluble polymer combined system was proposed to suppress the micro-defects on the surface of the silicon wafer.
Funder
the Major National Science and Technology Special Projects
the Natural Science Foundation of Hebei Province
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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