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Mechanism Analysis of Nanoparticle Removal Induced by the Marangoni-driven Flow in Post-CMP Cleaning

  • Published:2020-02-05 Issue:2 Volume:9 Page:023002
  • ISSN:2162-8777
  • Container-title:ECS Journal of Solid State Science and Technology
  • language:
  • Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Li Changkun,Zhao Dewen,Xie Lile,Lu Xinchun

Funder

National Natural Science Foundation of China

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review—Post-Chemical Mechanical Planarization Cleaning Technology;ECS Journal of Solid State Science and Technology;2023-11-01

2. Recent advances and future developments in PVA brush scrubbing cleaning: A review;Materials Science in Semiconductor Processing;2022-12

3. Intermolecular and surface forces in atomic-scale manufacturing;International Journal of Extreme Manufacturing;2022-03-28

4. Static and dynamic interaction between polyvinyl acetal brushes and flat surfaces—Measuring near-surface brush volume ratio and nodule volume change for moving brushes;Microelectronic Engineering;2022-02

5. Study on particle removal during the Co post-CMP cleaning process;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2021-10
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