A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films-Reference-Cited by-同舟云学术

A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films

Published:1983-09-01 Issue:9 Volume:130 Page:1888-1893
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Cobianu C.¹,Pavelescu C.¹

Affiliation:

1. Microelectronica, R‐72996, Bucharest, Romania

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2120118/pdf

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