Author:
Zhang Liping,Ljazouli Rami,Lefaucheux Philippe,Tillocher Thomas,Dussart Remi,Mankelevich Yuri A.,de Marneffe Jean-Francois,de Gendt Stefan,Baklanov Mikhail R.
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference52 articles.
1. Low dielectric constant materials for microelectronics
2. Dubois G. Volksen W. , in Advanced Interconnects in ULSI Technology, edited by Baklanov M. R. Ho P. S. Zschech E. , p. 3, John Wiley & Sons Ltd., (2012).
3. Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition
4. Markley T. J. Gao X. Langsam M. Robeson L. M. O’Neill M. L. Sierocki P. R. Motakef M. Roberts D. A. , in Proceedings of Advanced Metallization Conference, 449 (2000).
5. Advanced Interconnects for ULSI Technology
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