Cryo Plasma Etching of Porous Low-k Dielectrics
-
Published:2023-09-08
Issue:S1
Volume:57
Page:S115-S118
-
ISSN:0018-1439
-
Container-title:High Energy Chemistry
-
language:en
-
Short-container-title:High Energy Chem
Author:
Miakonkikh A. V.,Kuzmenko V. O.,Rudenko K. V.
Publisher
Pleiades Publishing Ltd
Subject
Physical and Theoretical Chemistry
Reference10 articles.
1. Dutta, S., Kundu, S., Gupta, A., Jamieson, G., Granados, J.F.G., Bömmels, J., Wilson, C.J., Tőkei, Z., and Adelmann, C., IEEE Electron. Device Lett., 2017, vol. 38, p. 949. 2. Volksen, W., Miller, R.D., and Dubois, G., Chem. Rev., 2010, vol. 110, p. 56. 3. Zhang, L., Ljazouli, R., Lefaucheux, P., Tillocher, T., Dussart, R., and Mankelevich, Y.A., ECS J. Solid State Sci. Technol., 2013, vol. 2, no. 6, p. N131. 4. Baklanov, M.R., Marneffe, J.-F., Zhang, L., Ciofi, I., and Tokei, Z., Solid State Technol., 2014, vol. 57, no. 5, p. 1. 5. Kanarik, K.J., Lill, T., Hudson, E.A., Sriraman, S., Tan, S., Marks, J., Vahedi, V., and Gottscho, R.A., J. Vac. Sci. Technol., A, 2015, vol. 33, p. 020802.
|
|