Effect of Driving Frequency on Growth and Structure of Silicon Films Deposited by Radio-Frequency and Very-High-Frequency Magnetron Sputtering
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Passivation of nanocrystalline silicon photovoltaic materials employing a negative substrate bias
2. Nanocrystalline silicon films directly made by pulsed-DC magnetron sputtering
3. Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition
4. Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
5. Development of microcrystalline silicon thin films with high deposition rate (over 10nm/s) using VHF hollow electrode enhanced glow plasma
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge;Plasma Science and Technology;2022-01-17
2. Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering;Plasma Science and Technology;2018-11-13
3. Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure;Plasma Science and Technology;2018-08-20
4. In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution;Coatings;2018-07-06
5. Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering;Chinese Physics B;2017-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3