Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering
Author:
Funder
National Natural Science Foundation of China
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/2058-6272/aae7dd/pdf
Reference35 articles.
1. Magnetron sputtering – Milestones of 30 years
2. Magnetron sputtering: a review of recent developments and applications
3. The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films
4. DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage
5. Radio frequency substrate biasing effects on the insulator-metal transition behavior of reactively sputtered VO2 films on sapphire (001)
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