Optimization of Multilayer Thin Film Passivation Processes for Improving Cache Memory Device Performance
Author:
Affiliation:
1. Institute of Materials Science and Engineering, Chiao‐Tung University, Taiwan
2. Winbond Electronics Corporation, Hsinchu 300, Taiwan
3. Department of Materials Science and Engineering, Cheng‐Kung University Tainan 701, Taiwan
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1391796/pdf
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Temperature Dependence of Endurance Characteristics in NOR Flash Memory Cells;2006 IEEE International Reliability Physics Symposium Proceedings;2006
2. Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide;Journal of Applied Physics;2000-03-15
3. Impact of plasma-enhanced chemical vapor deposited oxide characteristics on interconnect via resistance and device performance of four-transistor static random access memory with polysilicon load resistors;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999
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