Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.372260
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1. Enhanced hot-carrier degradation due to water-related components in TEOS/O/sub 3/ oxide and water blocking with ECR-SiO/sub 2/ film
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4. Comparison of properties of dielectric films deposited by various methods
5. Effect of Stress on Water Diffusion in Silica Glass
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