Chemical Mechanical Polishing Mechanisms of Low Dielectric Constant Polymers in Copper Slurries-Reference-Cited by-同舟云学术

Chemical Mechanical Polishing Mechanisms of Low Dielectric Constant Polymers in Copper Slurries

Published:1999-11-01 Issue:11 Volume:146 Page:4309-4315
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Borst Christopher L.¹²,Thakurta Dipto G.¹²,Gill William N.¹²,Gutmann Ronald J.¹³

Affiliation:

1. Center for Integrated Electronics and Electronics Manufacturing

2. Department of Chemical Engineering

3. Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, United States of America

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1392632/pdf

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