Effect of Potassium Periodate Oxidizer on Germanium Chemical Mechanical Planarization Using Fumed Silica as Abrasive
Author:
Funder
Department of Science and Technology, Ministry of Science and Technology
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference28 articles.
1. Chemical Mechanical Polishing of Epitaxial Germanium on SiO2-patterned Si(001) Substrates
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3. Chemical mechanical planarization of germanium shallow trench isolation structures using silica-based dispersions
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5. Chemical Mechanical Polishing of Ge Using Colloidal Silica Particles and H2O2
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