Author:
Matovu J. B.,Penta N. K.,Peddeti S.,Babu S. V.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference34 articles.
1. C. Claeys and E. Simeon ,Germanium- based technologies, from materials to devices, 1st Ed., Elsevier, Amsterdam (2007).
2. P. Ong, K. Kellens, N. Chiodarelli, M. Meuris, and P. Leunissen , CMP of Novel Materials,Lake Placid Meeting(2009).
3. P. Ong, K. Kellens, L. Witters, and L. H. A. Leunissen , CMP of Ge for High Mobility Channels,International Conference on Planarization∕CMP Technology, 69–73 (2010).
4. Chemical Mechanical Polishing of Epitaxial Germanium on SiO2-patterned Si(001) Substrates
5. Strained Si/strained Ge dual-channel heterostructures on relaxed Si0.5Ge0.5 for symmetric mobility p-type and n-type metal-oxide-semiconductor field-effect transistors
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