Editors' Choice—Control of Si3N4 Etching Kinetics and Selectivity to SiO2 by the Additives in Superheated Water
Author:
Funder
Ministry of Trade, Industry and Energy
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference24 articles.
1. Aritome S. , NAND flash memory technologies, p. 273, John Wiley & Sons, Hoboken, NJ (2015).
2. Three-Dimensional 128 Gb MLC Vertical nand Flash Memory With 24-WL Stacked Layers and 50 MB/s High-Speed Programming
3. A stacked memory device on logic 3D technology for ultra-high-density data storage
4. The Etching of Silicon Nitride in Phosphoric Acid with Silicon Dioxide as a Mask
5. Pattern Etching of CVD Si3 N 4 / SiO2 Composites in HF / Glycerol Mixtures
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Phosphoric Acid Wet Etching of Sandwiched Silicon Nitride Nanolayers;ChemistrySelect;2024-09-04
2. Effect of internal structure of a batch-processing wet-etch reactor on fluid flow and heat transfer;Chinese Journal of Chemical Engineering;2024-08
3. Unveiling polycrystalline silicon channel dissolution mechanism in wet etching process of 3D NAND fabrication;Surfaces and Interfaces;2024-07
4. Study on the SiO2 Wet-Etching Mechanism Using γ-Ureidopropyltriethoxysilane as an Inhibitor for 3D NAND Fabrication;ACS Applied Electronic Materials;2024-03-19
5. Behavior of oxide regrowth during the selective Si3N4 etching process on 3D NAND structures using finite element computational simulations;Journal of Industrial and Engineering Chemistry;2024-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3