Author:
Choi Wonseop,Abiade Jeremiah,Lee Seung-Mahn,Singh Rajiv K.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. J. M. Steigerwald, S. P. Murarka, and R. J. Gutmann,Chemical-Mechanical Planarization of Microelectronic Materials, John Wiley & Sons, New York (1997).
2. R. K. Singh, R. Bajaj, M. Moinpour, and M. Meuris, Mater. Res. Soc. Symp. Proc., 613 (2001).
3. Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors
Cited by
44 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献