Implant Anneal Using a Single-Wafer Furnace and a Lamp-Based Rapid Thermal Annealing System-Reference-Cited by-同舟云学术

Implant Anneal Using a Single-Wafer Furnace and a Lamp-Based Rapid Thermal Annealing System

Published:2002 Issue:7 Volume:149 Page:G424
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Yoo Woo Sik,Fukada Takashi,Setokubo Tsuyoshi,Aizawa Kazuo,Ohsawa Toshinori,Takahashi Nobuaki,Enjoji Keiichi

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. J. K. Truman, C. M. Gronet, N. L. Kuan, C. M. Czarnik, G. E. Miner, D. C. Jennings, and I. Beinglass, inProceedings of 7th International Conference on Advanced Thermal Processing of Semiconductors-RTP’99, Colorado Springs, CO, 6 (1999).

2. J. Goli and A. Jain, inProceedings of 8th International Conference on Advanced Thermal Processing of Semiconductors-RTP’2000, Gaithersburg, MD, 212 (2000).

3. A. J. Mayur, A. Jaggi, and A. Jain, inProceedings 8th International Conference on Advanced Thermal Processing of Semiconductors-RTP’2000, Gaithersburg, MD, 196 (2000).

4. Slip-Free Rapid Thermal Processing in Single Wafer Furnace

5. Single Wafer Furnace and Its Thermal Processing Applications

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