Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
Author:
Affiliation:
1. IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598
2. Department of Chemical Engineering and Applied Chemistry, Columbia University, New York, New York 10027
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.2086343/pdf
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