Removal of Fluorocarbon Residues on  CF 4 /  H 2 Reactive‐Ion‐Etched Silicon Surfaces Using a Hydrogen Plasma

Author:

Simko J. P.12,Oehrlein G. S.12,Mayer T. M.12

Affiliation:

1. IBM Research Division, T.J. Watson Research Center, Yorktown Heights, New York 10598

2. Department of Chemistry, University of North Carolina, Chapel Hill, North Carolina 27599‐3290

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

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