Multiscale Computational Analysis of the Interaction between the Wafer Micro-Topography and the Film Growth Regimes in Chemical Vapor Deposition Processes-Reference-Cited by-同舟云学术

Multiscale Computational Analysis of the Interaction between the Wafer Micro-Topography and the Film Growth Regimes in Chemical Vapor Deposition Processes

Published:2012 Issue:4 Volume:1 Page:P197-P203
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Cheimarios Nikolaos,Kokkoris George,Boudouvis Andreas G.

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference25 articles.

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2. Chemical vapour deposition of coatings

3. Kleijn C. R. , in Chemical physics of thin film deposition processes for Micro- and Nano- technologies, Pauleau Y. , Editor, p. 119, Kluwer Academic Publishers, The Netherlands (2002).

4. Illuminating nonlinear dependence of film deposition rate in a CVD reactor on operating conditions

5. Mesoscopic Scale Modeling of Microloading during Low Pressure Chemical Vapor Deposition

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