A multi-parallel multiscale computational framework for chemical vapor deposition processes
Author:
Publisher
Elsevier BV
Subject
Modeling and Simulation,General Computer Science,Theoretical Computer Science
Reference20 articles.
1. Multiscale modeling in chemical vapor deposition processes: coupling reactor scale with feature scale computations;Cheimarios;Chem. Eng. Sci.,2010
2. Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: a combined simulator coupling modules of surface etching, local flux calculation, and profile evolution;Kokkoris;J. Vac. Sci. Technol. A,2004
3. Ansys v12, USA, Fluent's Documentation (2010).
4. A unified line-of-sight model of deposition in rectangular trenches;Cale;J. Vac. Sci. Technol. B,1990
5. Multiscale simulation of nanosystems;Nakano;Comput. Sci. Eng.,2001
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