Author:
Isheden C.,Hellström P.-E.,Radamson H. H.,Zhang S.-L.,Östling M.
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference10 articles.
1. T. Matsuda, S. Shishiguchi, and H. Kitajima, Extended Abstracts of the First International Workshop on Junction Technology, 2000, p. 29 (2000).
2. Strain compensation in ternary Si1 − x − yGexBy films
3. C. Isheden, H. H. Radamson, E. Suvar, P.-E. Hellström, and M. Östling,
J. Electrochem. Soc
., Submitted.
Cited by
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