Author:
Ishida Hiroyuki,Ogashiwa Toshinori
Abstract
Wafer-level low-temperature hermetic seal bonding has been successfully demonstrated using sub-micron-size gold particles (0.3 μm mean diameter) with adopting a narrow-width rim structure to reduce the required total bonding force down to the range available on commercial wafer bonders. Conventional stencil printing combined with a newly developed suspended metal mask was employed as a cost-effective fabrication method to form sealing lines over the rim structure. Au-Au thermo-compression bonding using 10 μm-wide rim structure was performed at 200°C for 30 minutes with the bonding pressure of 200 MPa. An excellent hermeticity was achieved and the encapsulated pressure inside the sealed cavity was estimated to be around 100 Pa.
Publisher
The Electrochemical Society
Cited by
2 articles.
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