Bulk and Interface Engineering of GeO2/Ge for High-κ/Germanium Gate Stack

Author:

Oniki Yusuke,Iwazaki Yoshitaka,Ueno Tomo

Abstract

Effects of germanium-monoxide desorption on both the interface and the oxide bulk of thermally grown germanium-dioxide as well as its controlling methods have been investigated. The density of interface states was increased and water absorbency of the oxide film was enhanced by the desorption. The density of positive charge strongly depends on amount of water molecules in the oxide. Moreover, the flat-band voltage shift due to the positive charge, which can be generated at a given electric field from donor-like traps, increases linearly with the maximum field in the oxide. It was found that suppression of both the germanium-monoxide desorption and the water absorption are the keys for fabrication of high-quality germanium-dioxide film as an inter-layer of the high-κ/germanium gate stack.

Publisher

The Electrochemical Society

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Water-Related Hole Traps at Thermally Grown GeO$_{2}$–Ge Interface;Japanese Journal of Applied Physics;2012-04-20

2. Water-Related Hole Traps at Thermally Grown GeO2–Ge Interface;Japanese Journal of Applied Physics;2012-04-01

3. Fabrication of High-k/Ge Stacks with High Quality GeO2 Interlayer;ECS Transactions;2011-10-04

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