Good Conformability of Indium-Tin Oxide Thin Films Prepared by Spray Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Good Conformability of Indium-Tin Oxide Thin Films Prepared by Spray Chemical Vapor Deposition

Published:2009 Issue:5 Volume:12 Page:D42
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Kondo Takeshi,Sawada Yutaka,Funakubo Hiroshi.,Akiyama Kensuke,Kiguchi Takanori,Wang Meihan,Uchida Takayuki

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference14 articles.

1. Step coverage simulation and measurement in a dc planar magnetron sputtering system

2. Growth and nanostructure of conformal ruthenium films by liquid-source metalorganic chemical vapor deposition

3. Ge film growth in the presence of Sb by metal organic chemical vapor deposition

4. Downstream microwave plasma‐enhanced chemical vapor deposition of oxide using tetraethoxysilane

5. Effects of precursors and substrate materials on microstructure, dielectric properties, and step coverage of (Ba, Sr)TiO3 films grown by metalorganic chemical vapor deposition

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1. Preparation of iridium metal films by spray chemical vapor deposition;MRS Advances;2020-06

2. Effect of heat treatment atmosphere on the piezoresistivity of indium tin oxide ceramic strain sensor;Ceramics International;2019-10

3. Comparative study of macroporous silicon-based photovoltaic characteristics using indium tin oxide‑silicon and pn‑silicon junction based devices;Microelectronic Engineering;2018-11

4. The effect of annealing on the structural, electrical, optical and electrochromic properties of indium-tin-oxide films deposited by RF magnetron sputtering technique;Optik;2017-08

5. Wide-bandgap CuGaSe 2 thin film solar cell fabrication using ITO back contacts;Vacuum;2015-10

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