Threshold Levels and Effects of Feed Gas Impurities on Plasma Etching Processes-Reference-Cited by-同舟云学术

Threshold Levels and Effects of Feed Gas Impurities on Plasma Etching Processes

Published:1990-11-01 Issue:11 Volume:137 Page:3526-3536
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Zau Gavin C. H.¹²,Baston Linda D.¹²,Gray David C.¹²,Tepermeister Igor¹²,Sawin Herbert H.¹²,Mocella Michael T.¹²

Affiliation:

1. Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

2. Electronics Department, E. I. du Pont de Nemours & Company, Incorporated, Wilmington, Delaware 19898

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2086262/pdf

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