Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor-Reference-Cited by-同舟云学术

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Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

Published:2002-01 Issue:1 Volume:20 Page:43-52
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ullal Saurabh J.,Godfrey Anna R.,Edelberg Erik,Braly Linda,Vahedi Vahid,Aydil Eray S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1421602

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