Influence of Hydrogen Pressure on the Properties of CVD Tungsten Silicide Films-Reference-Cited by-同舟云学术

Influence of Hydrogen Pressure on the Properties of CVD Tungsten Silicide Films

Published:1995-05-01 Issue:5 Volume:142 Page:1608-1614
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Thomas N.¹,Dutron A. M.¹,Vahlas C.²,Bernard C.¹,Madar R.³

Affiliation:

1. L.T.P.C.M., E.N.S.E.E.G., 38402 Saint Martin d'Hères Cedex, France

2. Laboratoire de Cristallochimie, Réactivité et Protection des Matériaux, ENS de Chimie, 31077 Toulouse Cedex, France

3. L.M.G.P., E.N.S.P.G., 38402 Saint Martin d'Hères Cedex, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2048621/pdf

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