Characterization of DC magnetron sputtering deposited thin films of TiN for SBN/MgO/TiN/Si structural waveguide
Author:
Publisher
Zhejiang University Press
Subject
General Engineering
Link
http://link.springer.com/content/pdf/10.1631/jzus.2006.A0472.pdf
Reference14 articles.
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2. Banerjee, R., Chandra, R., Ayyub, P., 2002. Influence of the sputtering gas on the preferred orientation of nanocrystalline titanium nitride thin films. Thin Solid Films, 405(1–2):64–72. [doi:10.1016/S0040-6090(01)01705-9]
3. Chen, Y.M., Yu, G.P., Huang, J.H., 2001. Role of process parameters in the texture evolution of TiN films deposited by hollow cathode discharge ion platingtechnol. Surf. Coat. Technol., 141(2–3):156–163. [doi:10.1016/S0257-8972(01)01201-4]
4. Chou, W.J., Yu, G.P., Huang, J.H., 2001. Deposition of TiN thin film on Si (100) by HCD ion plating. Surf. Coat. Technol., 140(3):206–214. [doi:10.1016/S0257-8972(01)01120-3]
5. Cuniot-Ponsard, M., Desvignes, J.M., Ea-Kim, B., 2003. Radio frequency magnetron sputtering deposition of hetero-epitaxial strontium barium niobate thin films (SrxBa1-x Nb2O6). J. Appl. Phys., 93(3):1718–1724. [doi:10.1063/1.1535749]
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